发明名称 SEMICONDUCTOR MANUFACTURING METHOD, AND ITS MANUFACTURING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To enable an addition of extremely small quantity of catalyst element promoting polycrystalline. SOLUTION: The manufacturing equipment comprises: a first spinner 14 which has a function forming an oxide film by oxidizing a front surface of amorphous silicon film, and includes a first liquid supplying nozzle arm 16 equipped with a first nozzle 17 and a third nozzle 20, and a second liquid supplying nozzle arm 18 equipped with a second nozzle 19; a coater 22 equipped with a slit coater nozzle 23 having a function applying a solution containing the catalyst element promoting a crystallization of the amorphous silicon through the oxide film by a slit coat method; a second spinner 24 having a function depositing the catalyst element to the oxide film by drying a liquid membrane of the solution by rotating a substrate 11 in atmosphere; and a robot arm 12 and robot arm rail 21 both serving as conveyance means for carrying the substrate 11 into each of processors of the first spinner 14, the coater 22, and the second spinner 24, and for carrying out from each processor. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007208126(A) 申请公布日期 2007.08.16
申请号 JP20060027234 申请日期 2006.02.03
申请人 SHARP CORP 发明人 YAMAMOTO YUICHI
分类号 H01L21/20;G02F1/1368;H01L21/336;H01L29/786 主分类号 H01L21/20
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