METHOD FOR LOW-TEMPERATURE SEALING OF A CAVITY UNDER VACUUM OR UNDER CONTROLLED ATMOSPHERE
摘要
<p>The invention concerns a method for sealing a cavity of a component placed in a chamber which consists in physical vapour deposition (PVD) of germanium or silicon.</p>
申请公布号
WO2007090971(A1)
申请公布日期
2007.08.16
申请号
WO2007FR50697
申请日期
2007.01.25
申请人
COMMISSARIAT A L'ENERGIE ATOMIQUE;ANDRE, BERNARD;ARNAUD, AGNES
