发明名称 |
Resist underlayer coating forming composition for mask blank, mask blank and mask |
摘要 |
There is provided a resist underlayer coating forming composition used in processes for manufacturing a mask blank and a mask, and a mask blank and a mask manufactured from the composition. The resist underlayer coating forming composition comprises a polymer compound having a halogen atom-containing repeating structural unit and a solvent. In a mask blank including a thin film for forming transfer pattern and a chemically-amplified type resist coating on a substrate in that order, the composition is used for forming a resist underlayer coating between the thin film for forming transfer pattern and the resist coating. The polymer compound is preferably a compound containing a halogen atom in an amount of at least 10 mass %.
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申请公布号 |
US2007190459(A1) |
申请公布日期 |
2007.08.16 |
申请号 |
US20070703723 |
申请日期 |
2007.02.08 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
HASHIMOTO MASAHIRO;ENOMOTO TOMOYUKI;SAKAGUCHI TAKAHIRO;SAKAMOTO RIKIMARU;NAGAI MASAKI |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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