发明名称 |
APPARATUS AND METHOD FOR REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY |
摘要 |
An apparatus for reducing contamination in immersion lithography includes a wafer chuck assembly including a wafer chuck configured to hold a semiconductor wafer on a support surface thereof. An O-ring assembly has a deformable O-ring attached to movable support sections arranged in a generally circular configuration so as to surround the wafer.
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申请公布号 |
US2007188731(A1) |
申请公布日期 |
2007.08.16 |
申请号 |
US20060307669 |
申请日期 |
2006.02.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BEZAMA RASCHID J.;GOLDFARB DARIO L.;LAI KAFAI;LIU XIAO H.;SHNEYDER DMITRIY |
分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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