发明名称 METHOD FOR PRODUCING CeO2 FINE PARTICLES AND POLISHING SLURRY CONTAINING SUCH FINE PARTICLES
摘要 To provide a process for producing CeO 2 fine particles having high crystallinity, being excellent in uniformity of composition and particle size and having a small particle size, and a polishing slurry containing such fine particles. A process for producing CeO 2 fine particles, which comprises a step of obtaining a melt containing, as represented by mol% based on oxides, from 5 to 50% of CeO 2 , from 10 to 50% of RO (wherein R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba) and from 30 to 75% of B 2 O 3 , a step of quenching the melt to obtain an amorphous material, a step of precipitating CeO 2 crystals from the amorphous material, and a step of separating the CeO 2 crystals from the obtained crystallized product, in this order. A polishing slurry containing from 0.1 to 20 mass% of such fine particles.
申请公布号 EP1818312(A1) 申请公布日期 2007.08.15
申请号 EP20050805415 申请日期 2005.11.02
申请人 ASAHI GLASS COMPANY, LIMITED 发明人 BEPPU, YOSHIHISA;SAKAI, TOMOHIRO;KASHIWABARA, SATOSHI;SUNAHARA, KAZUO
分类号 C01F17/00;B24B37/00;C09K3/14;H01L21/304 主分类号 C01F17/00
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