METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, METHOD FOR PLAZMA PROCESSING, AND METHOD FOR FORMING GATE INSULATING FILM,申请号KR20067008751-传众专利搜索

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发明名称	METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, METHOD FOR PLAZMA PROCESSING, AND METHOD FOR FORMING GATE INSULATING FILM
摘要
申请公布号	KR100746120(B1)	申请公布日期	2007.08.13
申请号	KR20067008751	申请日期	2006.05.04
申请人		发明人
分类号	H01L21/316;C23C8/02;C23C8/34;C23C8/36;C23C16/44;C23C16/455;H01L21/205;H01L21/3065;H01L21/314	主分类号	H01L21/316
代理机构		代理人
主权项
地址

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