发明名称 METHOD FOR FORMING ELECTRODE ON FINE MATERIAL LAYER
摘要 A method for forming an electrode on a fine material layer is provided to produce an electrode on a fine material layer in a simple process with high reproductivity. A method includes the steps of: spreading a fine material layer(12), onto which an electrode is attached, on a substrate(10); forming an electrode layer(14) on the fine material layer to fix the fine material layer; and directly etching the electrode layer by focused ion beam to form a pattern on the electrode. The electrode pattern is formed by etching the electrode layer on the fine material layer in the vertical direction and etching the etched electrode layer in the horizontal direction. The fine material layer is a nano size or micro size material layer.
申请公布号 KR20070080729(A) 申请公布日期 2007.08.13
申请号 KR20060012138 申请日期 2006.02.08
申请人 KIM, SANG JAE 发明人 KIM, SANG JAE;LEE, SUNK IK;OH, SANG YUL
分类号 B82B3/00 主分类号 B82B3/00
代理机构 代理人
主权项
地址