| 摘要 |
A pattern forming method and a method of manufacturing a display device using the same are provided to reduce an adhesive property between a surfactant and an organic semiconductor layer by changing a property of the surfactant into a hydrophilic property using an exposure process. A photosensitive surface surfactant(110) is coated on a base film(100). An organic layer(120) is formed on the surface surfactant. The organic layer is exposed using a mask, where an aperture with a predetermined pattern is formed. An interface adhesive property between the surface surfactant and the organic layer is reduced. The base film is attached to an insulation substrate(200). The base film is separated from the insulation substrate, so that the organic layer corresponding to the exposed surface surfactant is transferred to the insulation substrate.
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