| 摘要 |
A wide beam uniformity controller of an ion implanter is provided to prevent loss of a rotary shaft of a motor by improving a coupling structure between the rotary shaft of the motor and a coupler. A wide beam uniformity controller includes a plurality of rods(110) and a driving unit. The rods are independently installed in a row at an upper side and a lower side of an ion beam path in order to be moved upwardly and downwardly. The driving unit moves the rods, upwardly and downwardly. The driving unit includes a motor(122) and a coupler(124). The motor includes a rotary shaft having at least one flat plane. The coupler includes a first insertion hole and a second insertion hole in order to transmit the power of the motor to the rods. A motor shaft is inserted into the first insertion hole formed at one end of the coupler. A rod shaft is inserted into the second insertion hole formed at the other end of the coupler.
|
