发明名称 |
System and method for cleaning chemistry and processing during thin film magnetic head wafer fabrication |
摘要 |
A solution of ammonium citrate and benzotriazole (BTA) is used to clean thin film magnetic head wafers. When used with brushing, the solution is a highly efficient process for removing particles, such as those generated during chemical-mechanical polishing (CMP), without causing corrosion and roughness. This process may be used on all CMP layers in thin film magnetic head wafer fabrication.
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申请公布号 |
US2007181151(A1) |
申请公布日期 |
2007.08.09 |
申请号 |
US20060350643 |
申请日期 |
2006.02.09 |
申请人 |
GUTHRIE HUNG-CHIN;JIANG MING;LARA NICK;YANG JOHN J |
发明人 |
GUTHRIE HUNG-CHIN;JIANG MING;LARA NICK;YANG JOHN J. |
分类号 |
C23G1/00;B08B3/00;B08B7/00 |
主分类号 |
C23G1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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