| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective reticle for an EUV exposing device excellent in a line width controlability and capable of decreasing its manufacturing cost. <P>SOLUTION: The reflective reticle 2 with a first absorber 8 formed in pattern shape on the surface of a multilayer film mirror 6 for reflecting an extreme ultraviolet light comprises a reflectance factor adjustment means 10 for adjusting the reflectance factor of the extreme ultraviolet light at a part of the surface of the reticle. <P>COPYRIGHT: (C)2007,JPO&INPIT |
