SAMPLE SURFACE INSPECTION DEVICE AND INSPECTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a defect inspection device having unprecedented high accuracy, in a defect inspection device of a manufacturing process of a semiconductor device; and to provide a defect inspection (or evaluation) method.

SOLUTION: In this method for inspecting a sample surface by a mapping type electron beam inspection device, the size of an irradiation region on the sample surface by an electron beam generated from an electron gun 21 is set larger than a pattern size on the sample surface and formed into a generally circular or elliptical shape; the pattern on the sample surface is irradiated nearly at its center with the electron beam; and secondary electrons generated from the sample surface by the irradiation of the electron beam are focused on an electron detection surface of a detector to inspect the sample surface.

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