SEMICONDUCTOR EXPOSURE METHOD AND METHOD OF CONTROLLING SEMICONDUCTOR EXPOSURE APPARATUS

摘要

A semiconductor exposure method that uses a semiconductor exposure apparatus to expose a wafer is described. The semiconductor exposure apparatus comprises at least an exposure lens, a platform for supporting the wafer and a liquid-circulating device. The liquid-circulating device supplies a liquid to the space between the wafer and the exposure lens during exposure. One major feature of the present invention is that at least one aligning light source is used to perform an alignment operation for aligning the supporting platform before the actual exposure, wherein the aligning light source has a particular wavelength in which the effect on the aligning light source due to the evaporation of the liquid is minimized to prevent the liquid from affecting the alignment operation.