发明名称 METHOD OF MANUFACTURING COMPOSITION FOR FERROELECTRIC THIN FILM FORMATION
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a composition for ferroelectric thin film formation excelling in storage stability and uniformity of a film in applying and drying it. <P>SOLUTION: Metallic alkoxide, metallic acetate, metal acetylacetonate salt, amines and an alcohol solvent are mixed, this mixture 1 is heated by using a distillation column 3, and refluxed while removing a part of an evaporant, and water is replenished, whereby a colloid solution for an MOD method is formed. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007200588(A) 申请公布日期 2007.08.09
申请号 JP20060014665 申请日期 2006.01.24
申请人 SEIKO EPSON CORP 发明人 KAMEI HIROYUKI
分类号 H01B19/00;H01B3/00;H01L21/316;H01L41/18;H01L41/187;H01L41/317;H01L41/39 主分类号 H01B19/00
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