| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which malfunction and poor processing due to liquid adhering to a substrate are prevented in an exposure device. <P>SOLUTION: The substrate processing apparatus 500 comprises an indexer block 9, a processing block 10 for antireflection film, a processing block 11 for resist film, a developing block 12, a processing block 13 for resist cover film, a block 14 for removing resist cover film and an interface block 15. An exposure device 16 is disposed contiguously to the interface block 15. The interface block 15 includes a substrate exchange section 150. Three cleaning/drying processing units are stacked in the substrate exchange section 150. In the cleaning/drying processing unit, the cleaning and drying processes are performed to the substrate subjected to exposure. <P>COPYRIGHT: (C)2007,JPO&INPIT |
