| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which achieves such an excellent optical performance as to reduce the particles entrapped in its liquid. <P>SOLUTION: The exposure apparatus has a projecting optical system for projecting the pattern of a reticle on a processed object, and exposes the processed object to a light via a liquid so fed as to be sandwiched between the projecting optical system and the processed object. In this exposure apparatus, there are provided feeding nozzles for feeding the liquid and recovering nozzles for recovering the liquid, and at least either one of the feeding and recovering nozzles is constituted out of the material containing ceramic porous bodies each of which has an oxide film. <P>COPYRIGHT: (C)2007,JPO&INPIT |
