HOLOGRAM EXPOSURE DEVICE AND HOLOGRAM EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a hologram exposure device and a hologram exposure method capable of precisely forming holograms in a multiple patterning hologram optical element.

SOLUTION: The hologram exposure device 100 is used for manufacturing at least one substrate 33 and the oblong multiple patterning hologram optical element including a plurality of holograms 13 arranged in an array in the longitudinal direction on the substrate 33. The hologram exposure device 100 is provided with: a base 60; a vertically moving mechanism 3 which is disposed on the base 60 and is vertically movable; and a frame body 20 which is disposed on the vertically moving mechanism 3 and retains the substrate 33 and a substrate 1 for the oblong multiple patterning hologram optical element including a hologram photosensitive layer 31 disposed on the substrate 33 so as to be vertically extended. The hologram exposure device 100 forms the plurality of holograms 13 on the hologram photosensitive layer 31 by irradiating the substrate 1 for the oblong multiple patterning hologram optical element 1 with object light 46 and reference light 47 from the lateral side.

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