| 摘要 |
<p>An exposure system and an exposure method are provided to detect automatically a failed reticle and to prevent the generation of an exposure failure by measuring the haze and light transmissivity of a reticle surface in real time before a reticle loading process. An exposure system includes an exposure unit, a reticle case, a loader unit and an inspection unit. The exposure unit performs an exposure process by irradiating an exposure light on a substrate through a reticle. The reticle case stores a plurality of reticles. The loader unit includes a transfer arm for unloading the reticle from the reticle case and supplying the reticle to the exposure unit. The inspection unit(130) measures the haze and light transmissivity of the reticle before the reticle is loaded to the exposure unit. The inspection unit is composed of an inspection table(132) for loading the reticle, a light source generating part(134) for irradiating light to the reticle of the inspection table from an upper portion of the inspection table, and a measuring part(136) for outputting a measurement signal by measuring the light transmitted through the reticle at a lower portion of the inspection table.</p> |
