发明名称 |
AN OXIDE SINTERED BODY AND AN OXIDE FILM OBTAINED BY USING IT, AND A TRANSPARENT BASED MATERIAL CONTAINING IT |
摘要 |
<p>The oxide sintered body mainly consists of gallium, indium, and oxygen, and a content of the gallium is more than 65 at.% and less than 100 at.% with respect to a ll metallic elements, and the density of the sintered body is 5.0 g/cm3 or more. The oxi de film is obtained using the oxide sintered body as a sputtering target, and the shortest wavelength of the light where the light transmittance of the film itself except the substrate becomes 50% is 320nm or less. The transparent base material is obtained by forming the oxide film on one surface or both surfaces of a glass plate, a quartz plate, a resin plate or resin film where one surface or both surfaces are covered by a gas barrier film, or on one surface or both surfaces of a transparent plate selected fro m a resin plate or a resin film where the gas barrier film is inserted in the inside.</SDOAB ></p> |
申请公布号 |
CA2568966(A1) |
申请公布日期 |
2007.08.08 |
申请号 |
CA20062568966 |
申请日期 |
2006.11.27 |
申请人 |
SUMITOMO METAL MINING COMPANY LIMITED |
发明人 |
ABE, YOSHIYUKI;NAKAYAMA, TOKUYUKI |
分类号 |
B22F7/00;B22F1/00;B22F3/12;B22F3/26;C22C1/04;C22C28/00 |
主分类号 |
B22F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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