发明名称 AN OXIDE SINTERED BODY AND AN OXIDE FILM OBTAINED BY USING IT, AND A TRANSPARENT BASED MATERIAL CONTAINING IT
摘要 <p>The oxide sintered body mainly consists of gallium, indium, and oxygen, and a content of the gallium is more than 65 at.% and less than 100 at.% with respect to a ll metallic elements, and the density of the sintered body is 5.0 g/cm3 or more. The oxi de film is obtained using the oxide sintered body as a sputtering target, and the shortest wavelength of the light where the light transmittance of the film itself except the substrate becomes 50% is 320nm or less. The transparent base material is obtained by forming the oxide film on one surface or both surfaces of a glass plate, a quartz plate, a resin plate or resin film where one surface or both surfaces are covered by a gas barrier film, or on one surface or both surfaces of a transparent plate selected fro m a resin plate or a resin film where the gas barrier film is inserted in the inside.</SDOAB ></p>
申请公布号 CA2568966(A1) 申请公布日期 2007.08.08
申请号 CA20062568966 申请日期 2006.11.27
申请人 SUMITOMO METAL MINING COMPANY LIMITED 发明人 ABE, YOSHIYUKI;NAKAYAMA, TOKUYUKI
分类号 B22F7/00;B22F1/00;B22F3/12;B22F3/26;C22C1/04;C22C28/00 主分类号 B22F7/00
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