MANUFACTURING METHOD OF DISPLAY PANEL

摘要

A manufacturing method of a display panel is provided to form a transparent electrode comprising a polycrystalline ITO(Indium Tin Oxide) by patterning an amorphous ITO stacked and annealed at the low and high temperature. An amorphous ITO is deposited on a substrate having plural layers(S10). The amorphous ITO layer is annealed and patterned by a laser beam so that a transparent electrode having plural incision portions is formed(S20,S30). The transparent electrode is constructed by a polycrystalline ITO. The specific resistance of the transparent is about 200 to 200 ohm cm. The deposition of the amorphous ITO is performed at the temperature range of 25 to 100 degrees centigrade. The annealing is performed at the temperature range of 200 to 250 degrees centigrade. The wavelength range of the laser beam is about 100 nm to 400 nm or about 190 nm to 250nm. The layer beam is applied by the energy of about 100 mJ to 200 mJ for 0.1 to 4 seconds.