发明名称 Low doped layer for nitride-based semiconductor device
摘要 A repeatable and uniform low doped layer is formed using modulation doping by forming alternating sub-layers of doped and undoped nitride semiconductor material atop another layer. A Schottky diode is formed of such a low doped nitride semiconductor layer disposed atop a much more highly doped nitride semiconductor layer. The resulting device has both a low on-resistance when the device is forward biased and a high breakdown voltage when the device is reverse biased.
申请公布号 US7253015(B2) 申请公布日期 2007.08.07
申请号 US20040780526 申请日期 2004.02.17
申请人 VELOX SEMICONDUCTOR CORPORATION 发明人 POPHRISTIC MILAN;MURPHY MICHAEL;STALL RICHARD A.;SHELTON BRYAN S.;LIU LINLIN;CERUZZI ALEX D.
分类号 H01L21/00;H01L21/28;H01L23/48;H01L23/52;H01L29/15;H01L29/20;H01L29/40;H01L29/45;H01L29/47;H01L29/778;H01L29/872;H01L33/00 主分类号 H01L21/00
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