| 摘要 |
<p>A method for managing a focus in an exposure apparatus for use in fabrication of a semiconductor device is provided to sensitively cope with variations of the best focus by comparing the best focus with the previous best focus. A variation of best focus is monitored during a process(S107), and then the monitored focus and is compared with an allowable focus variation(S108). The best focus is detected during the process(S110). The best focus is compared with the previous best focus(S111), and if the best focus is within the allowable focus variation, the set of the best focus is updated(S114). If the best focus exceeds the allowable focus variation, an alarm is generated, and an operation of exposure apparatus is stopped.</p> |
