| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography system and a method thereof capable of realizing a more minute structure and a flexible lithography system. <P>SOLUTION: An exposure apparatus has at least one individually controllable element array for exposing a pattern on a substrate by combining first and second exposures. By the exposure apparatus in the first exposure, the individual controllable element array 11 of the exposure apparatus modulates a radiation beam and projects it on a substrate, and a repetitive pattern is formed. Also in the second exposure, the individually controllable element array 21 of the exposure apparatus modulates a radiation beam and projects it on a substrate W. A size of an exposure area on the substrate corresponding to one individually controllable element is larger in the second exposure than in the first exposure. The pattern to be projected on the substrate by the first exposure has a comparatively high resolution. On the contrary to this, the second exposure has a comparatively low resolution, but it can improve flexibility. <P>COPYRIGHT: (C)2007,JPO&INPIT |
