发明名称 MASK SUBSTRATE, ITS MANUFACTURING METHOD, LIQUID DROPLET EJECTION HEAD, AND METHOD FOR MANUFACTURING LIQUID DROPLET EJECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain a method for manufacturing a mask substrate enhancing a freedom degree of a design, a mask obtained by the method, a liquid ejection head manufactured by the mask, and a method for manufacturing a liquid droplet ejection device. SOLUTION: The mask substrate 1 using silicon as a material for protecting a portion other than a working portion of the substrate to be worked is equipped with a contact surface side opening portion 2 formed into a shape, corresponding to the shape of the working portion by anisotropic dry etching, on the surface side in contact with the substrate to be worked, and with an outside opening portion 3 in which a wall surface is formed with the silicone remained along a specified crystal face orientation by anisotropic wet etching from a surface side opposite to the surface in contact with the substrate to be worked and a through-hole communicating with the contact surface side opening portion is formed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007190730(A) 申请公布日期 2007.08.02
申请号 JP20060009066 申请日期 2006.01.17
申请人 SEIKO EPSON CORP 发明人 YAGI HIROSHI;SANO AKIRA
分类号 B41J2/16;B81C99/00 主分类号 B41J2/16
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