发明名称 METHODS AND APPARATUS FOR ION BEAM ANGLE MEASUREMENT IN TWO DIMENSIONS
摘要 <p>An angle measurement system (100) for an ion beam includes a flag (120) defining first (140) and second features (142), wherein the second feature has a variable spacing from the first feature, a mechanism (122) to translate the flag along a translation path so that the flag intercepts at least a portion of the ion beam (62), and a sensing device (123, 124) to detect the ion beam for different flag positions along the translation path and produce a sensor signal in response to the detected ion beam. The sensor signal and corresponding positions of the flag are representative of a vertical beam angle of the ion beam in a vertical plane . The sensing device may include a mask and a mechanism to translate the mask in order to define a beam current sensor on a portion of an associated Faraday sensor.</p>
申请公布号 WO2007087209(A1) 申请公布日期 2007.08.02
申请号 WO2007US01204 申请日期 2007.01.17
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;CUMMINGS, JAMES J.;OLSON, JOSEPH;CLOUGH, ARTHUR H.;HERMANSON, ERIC;MOLLICA, ROSARIO;MURPHY, PAUL J.;DONAHUE, MARK 发明人 CUMMINGS, JAMES J.;OLSON, JOSEPH;CLOUGH, ARTHUR H.;HERMANSON, ERIC;MOLLICA, ROSARIO;MURPHY, PAUL J.;DONAHUE, MARK
分类号 H01J37/244;H01J37/304 主分类号 H01J37/244
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