METHOD OF REMOVING PHOTORESIST AND APPARATUS FOR PERFORMING THE SAME

摘要

In a method and an apparatus for removing photoresist, a substrate is transferred in a horizontal direction by a conveyor, and a photoresist pattern and remaining impurities are removed by a plasma generator for supplying a reactive plasma, a first substrate cleaning section for supplying a cleaning solution and a second substrate cleaning section for supplying a cleaning gas. The plasma generator, the first substrate cleaning section and the second substrate cleaning section are arranged above the conveyor in a transferring direction of the substrate. Thus, the photoresist pattern and the remaining impurities may be removed in an in-line manner.