发明名称 Method for fabricating micrometer or nanometer channels
摘要 Thin films, which are deposited on a sacrificial film on a substrate, are released and bonded back on a substrate surface. This technology provides open and closed 2D confined micro-/nano-channels and channel networks on a substrate surface. The geometry, size and complexity of the channels and channel networks can be modified by the film and substrate properties as well as the treatment techniques of the sacrificial layer etching. A method to fabricate such structures with position- and pattern- controllability is provided.
申请公布号 EP1813570(A1) 申请公布日期 2007.08.01
申请号 EP20060001885 申请日期 2006.01.30
申请人 MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V. 发明人 SCHMIDT, DR. OLIVER G.;MEI, DR. YONGFENG;THURMER, DOMINIC;CAVALLO, FRANCESCA
分类号 B81B1/00 主分类号 B81B1/00
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