| 摘要 |
An apparatus for shielding a process chamber port having a dual zone and optical access features is provided to prevent plasma enhanced etching and deposition in a hole of a gas spray unit and to prevent the flaking of particles off an optical aperture. A process chamber window(48) is used for protecting an access region(52). The process chamber window includes a window member and a coating. The window member is composed of an outer side, a chamber side and a groove prolonged parallel with an axis of the window member from the outer side. The groove defines a first section of the access region, wherein the first second is protected from an electric field. The window member further includes a clear optical aperture with an annular type wall. The clear optical aperture is partially enclosed by the groove. The coating is formed on the annular type wall of the clear optical aperture. The annular type wall has the same inner diameter as a length value of an axis of the clear optical aperture. The coating is made of one selected from a group consisting of cerium oxide, zirconium oxide, yttria-stabilized zirconia, a thermally-sprayed aluminum oxide, yttrium oxide, and yttrium oxide with pore.
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