发明名称 PHOTOMASK WRITING PATTERN DESIGN SYSTEM USING AUTOMATED TOOL AND THE METHOD THEREFOR
摘要 A system and a system for supporting a PM writing pattern design by using an automated tool are provided to support procedures for inputting data/information, transferring a checking mail transfer, and obtaining a final approval, and enable a designer to easily accumulate/utilize all design data and quickly/effectively advance a process flow by using a web-based system. A customer company server(30) provides information such as an original copy of a PM design pattern and manufacturing specification. A PM writing pattern design supporting server(10) automatically calculates and verifies process parameters inputted to PM writing equipment according to the manufacturing specification received from the customer company server. A user terminal(20) calculates and verifies the process parameters by connecting to the PM writing pattern design supporting server. The PM writing pattern design supporting server includes a database(16) storing the manufacturing specification, customer company information, and the process parameters, a pattern editor(11), a parameter calculator(12), a pattern calculator(13), a verifier(14), and a web supporter(15).
申请公布号 KR20070078291(A) 申请公布日期 2007.07.31
申请号 KR20060008425 申请日期 2006.01.26
申请人 LG ELECTRONICS INC. 发明人 JUNG, CHEOL;YOO, DAE HO
分类号 G06F17/50 主分类号 G06F17/50
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