发明名称 FABRICATION METHOD OF CARBON NANOTUBE PROBE TIP
摘要 A method for manufacturing a carbon nanotube probe tip is provided to record/reproduce information at high density and have a simple and easy manufacturing process by miniaturizing the carbon nanotube probe tip. A substrate(10) is prepared. A catalyst metal layer(12) and an aluminum oxide layer are successively formed on the substrate(10). The aluminum oxide layer is anodized to be changed to a porous aluminum oxide layer having fine holes which expose the catalyst metal layer(12). A carbon nanotube(20) is grown on the exposed catalyst metal layer(12). A photoresist is coated on the aluminum oxide layer, and the carbon nanotube(20) to be used as a probe tip is selectively masked. The dry etching of certain depth is performed from an upper surface of the aluminum oxide layer which is not coated by the photoresist to expose the substrate(10). The isotropic undercut etching of the substrate surface exposed by the dry etching is performed to form a front end part for supporting the carbon nanotube(20). The catalyst metal layer(12) exposed by the isotropic undercut etching is etched to expose a lower surface of the aluminum oxide layer which surrounds the carbon nanotube(20). The wet etching of the aluminum oxide layer is performed from a lower surface side of the aluminum oxide layer, and the aluminum oxide layer and the photoresist formed on the aluminum oxide layer are removed. The catalyst metal layer(12) is formed by at least one metal selected from a group containing Ni, an invar, Fe, Co, and Au.
申请公布号 KR100745755(B1) 申请公布日期 2007.07.27
申请号 KR20060000886 申请日期 2006.01.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HONG, SEUNG BUM;KANG, DONG HUN;KO, HYOUNG SOO
分类号 G11B9/14 主分类号 G11B9/14
代理机构 代理人
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