| 摘要 |
<p>A pattern forming mold, a manufacturing method thereof and a method for forming a pattern using the same are provided to remove a residue film by selectively developing a portion with the residue film formed thereon through a light shielding pattern. A first transfer film is formed on a first substrate, and then is patterned to form a first transfer pattern. A light shielding layer is formed on a second substrate(200), and then is patterned to form a light shielding pattern(210). A second transfer film is formed on the second substrate. Then, the second transfer film is patterned to form a second transfer pattern(220) corresponding to the first transfer pattern, while the first substrate and the second substrate are compressing.</p> |
