发明名称 |
Highly sensitive positive photoresist composition |
摘要 |
Positive resists sensitive to UV, electron beam, and x-ray radiation which are alkaline developable are formulated from a polymer material comprising recurrent structures having alkaline soluble groups pendent to the polymer backbone, a portion of which groups are substituted with acid labile groups.
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申请公布号 |
US6051659(A) |
申请公布日期 |
2000.04.18 |
申请号 |
US19970961186 |
申请日期 |
1997.10.30 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MERRITT, DAVID PAUL;MOREAU, WAYNE MARTIN;WOOD, ROBERT LAVIN |
分类号 |
C08F8/00;G03F7/039;(IPC1-7):C08F8/00 |
主分类号 |
C08F8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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