发明名称 MULTILAYER-FILM REFLECTOR, METHOD FOR REGENERATING SAME, AND EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a multilayer-film reflector capable of removing a multilayer film from a substrate without spending time and costs and regenerating a new multilayer film, and achieving a desired reflection factor. <P>SOLUTION: The multilayer-film reflector comprises a multilayer film 103 in which a pair of layers 105 comprising a layer containing molybdenum and that containing silicon are piled up on a substrate 101. A film is formed so that a layer 107 containing molybdenum in at least a pair of partial layers is laminated wider than a layer containing silicon at a region including the layer containing silicon in the pair of layers and the periphery. When dissolving the multilayer film for peeling from the substrate, a layer containing molybdenum around the pair of layers is dissolved first, and then a layer containing molybdenum in the pair of layers continuous to the layer containing molybdenum around the pair of layers is dissolved, thus dissolving and peeling the entire multilayer film. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007189174(A) 申请公布日期 2007.07.26
申请号 JP20060007952 申请日期 2006.01.16
申请人 NIKON CORP 发明人 MATSUNARI SHUICHI
分类号 H01L21/027;G21K1/06 主分类号 H01L21/027
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