发明名称 COMPOSITION EVALUATING METHOD AND PHYSICAL PROPERTY EVALUATING METHOD OF NITRIDING SILICON OXIDE FILM
摘要 PROBLEM TO BE SOLVED: To easily evaluate composition and composition distribution in the minute region of nitriding silicon oxide film without destroying it. SOLUTION: In the evaluating method of composition of the nitriding silicon oxide film 2 formed on a substrate 1, the composition or the composition distribution of the nitriding silicon oxide film 2 is evaluated by measuring and analyzing a photoluminescence spectrum employing laser as a light source therefor. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007189083(A) 申请公布日期 2007.07.26
申请号 JP20060006325 申请日期 2006.01.13
申请人 TOPPAN PRINTING CO LTD;NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 GAMO SHUSUKE;KUROSU TOSHIAKI;ANDO HISAHIRO
分类号 H01L21/66 主分类号 H01L21/66
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