发明名称 |
COMPOSITION EVALUATING METHOD AND PHYSICAL PROPERTY EVALUATING METHOD OF NITRIDING SILICON OXIDE FILM |
摘要 |
PROBLEM TO BE SOLVED: To easily evaluate composition and composition distribution in the minute region of nitriding silicon oxide film without destroying it. SOLUTION: In the evaluating method of composition of the nitriding silicon oxide film 2 formed on a substrate 1, the composition or the composition distribution of the nitriding silicon oxide film 2 is evaluated by measuring and analyzing a photoluminescence spectrum employing laser as a light source therefor. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007189083(A) |
申请公布日期 |
2007.07.26 |
申请号 |
JP20060006325 |
申请日期 |
2006.01.13 |
申请人 |
TOPPAN PRINTING CO LTD;NATIONAL INSTITUTE FOR MATERIALS SCIENCE |
发明人 |
GAMO SHUSUKE;KUROSU TOSHIAKI;ANDO HISAHIRO |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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