| 摘要 |
<p>A substrate holding apparatus (4T) has a base member (30), a support section (81) formed on the base member (30) and supporting a substrate (P), a peripheral wall formed on the base member (30) and surrounding the support section (81), a first region (31) provided in an annular shape on the base member (30), along the peripheral wall (33), the first region (31) forming a first gap (G1) between the first region and the back face of the substrate (P) supported by the support section (81), the first region (31) holding influent liquid (LQ) entering from between the substrate (P) supported by the support section (81) and the peripheral wall (33), the influent liquid (LQ) being held between the first region (31) and the substrate (P), and a second region (32) provided on the base member (30), inside the first region (31) relative to the peripheral wall (33), the second region (32) forming a second gap (G2) between the second region (32) and the back face of the substrate (P) supported by the support section (81), the second gap (G2) being greater than the first gap (G1).</p> |
