发明名称 METAL JUNCTION DIODE AND PROCESS
摘要 A junction diode includes a substrate having first and second cathode regions separated by an anode region. Metal silicide layers contact the first and second cathode regions and the anode region. The anode region has a doping concentration sufficient to create a depletion region in the anode region adjacent to the metal silicide layer contacting the anode region. A fabrication process includes forming the anode region to have a doping concentration that increases in a direction into the anode region away from the substrate surface.
申请公布号 WO2006078410(A3) 申请公布日期 2007.07.26
申请号 WO2005US46429 申请日期 2005.12.21
申请人 LATTICE SEMICONDUCTOR CORPORATION 发明人 CHONG, NUI;OMID-ZOHOOR, FARROKH
分类号 H01L29/36 主分类号 H01L29/36
代理机构 代理人
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