| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for physical vapor deposition (PVD) for depositing a coating from a plurality of sources of materials having different vapor pressures. SOLUTION: The method for physical vapor deposition is inevitably associated with the steps of: forming molten pools (114, 115) of first and second materials in a coating chamber (122) of the apparatus (120); supporting an article (130) in the coating chamber; and depositing the coating (132) by a controlled synthesized product on the article by evaporating the molten pools (114, 115) by an energy beam (126). The controlled synthesized product contains a first metal and a relatively small amount of a reactive metal having a vapor pressure lower than that of the first metal. The first material contains at least the first metal, and the second material contains a reactive metal and at least a second metal. The second metal binds to the reactive metal so that the second material achieves a melting point lower than that of the reactive metal and a melting range broader than that of the reactive metal. COPYRIGHT: (C)2007,JPO&INPIT
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