发明名称 POLISHING PAD AND POLISHING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To efficiently remove a polishing product and an "old polishing liquid" remaining on a surface (polishing surface) or in through-holes of a polishing pad. <P>SOLUTION: A plurality of through-holes 66b provided inside a polishing pad 66 and extending in the thickness direction communicate with each other by communication grooves 66c. Conditioning of the polishing pad 66 can be performed while efficiently removing a polishing product and an "old polishing liquid" remaining on a surface (polishing surface) 66a, or in the through-holes 66b of the polishing pad 66 by pushing them to flow to the outside through the communication grooves 66c with a liquid which is applied to the polishing pad 66 when conditioning the polishing pad. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007189196(A) 申请公布日期 2007.07.26
申请号 JP20060295322 申请日期 2006.10.31
申请人 EBARA CORP 发明人 OBATA ITSUKI
分类号 H01L21/304;B24B37/20 主分类号 H01L21/304
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