| 摘要 |
A magnetically enhanced plasma source having external ferrite cores to be intersected is provided to minutely and uniformly tune a substrate by uniformly generating and maintaining plasma with high density in a plasma reaction chamber. A magnetically enhanced plasma source having external ferrite cores to be intersected includes a plasma reaction chamber(10), first and second ferrite cores(20,22), first and second induction coils(21), a first power supply source(30), a second power supply source(31), and a phase controller(5). The plasma reaction chamber(10) has a susceptor(15) on which a substrate is placed. The first and second ferrite cores(20,22) output a magnetic flux inside the plasma reaction chamber(10) by placing a magnetic flux outlet to face the inside of the plasma reaction chamber(10), are separated to upper and lower parts by a predetermined distance, and are arranged to cross each other over an upper part of the plasma reaction chamber(10). The first and second induction coils(21) are wound around the first and second ferrite cores(20,22) respectively, and induce a magnetic field at the first and second ferrite cores(20,22). The first power supplying source(30) supplies power of a first frequency to the first induction coil(21). The second power supplying source(31) supplies power of a second frequency to the second induction coil. The phase controller(5) controls a phase difference of the first and second power supplying sources(30,31), and induces a balancing rotation ion accelerating path at an upper part of the substrate by the vector sum of the magnetic fields induced by the first and second ferrite cores(20,22). |
