| 摘要 |
<p>A nanoimprint lithography process and a method for forming a transflective display device using the process are provided to easily repeatedly transfer a stamp shape by forming a rough surface using argon plasma process or ultraviolet irradiation. A first organic film is formed on a first substrate(101), and then a surface of the first organic film is roughly treated through argon plasma treating. A second organic film is formed on a second substrate(110), and then the first substrate having the first organic film is bonded to the second substrate, so that the rough surface of the first organic film is transferred to an upper surface(105a,114a) of the second organic film. The step of forming the first organic film is a coating of a photoresist layer.</p> |
