Photosensitive resin composition

摘要

A photosensitive composition comprising, (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200'000 or less; (B) at least one photoinitiator compound of formula I wherein R₁ is linear or branched C₁-C₁₂alkyl; R₂ is linear or branched C₁-C₄alkyl; R₃ and R₄ independently of one another are linear or branched C₁-C₈alkyl; and (C) a monomeric, oligomeric or polymeric compound having at least one olefinic double bond, is especially suitable for preparting photoresists, in particular color filters.