| 摘要 |
A method for manufacturing an array substrate of an LCD is provided to simplify the manufacturing process, by using a half-tone mask so as to facilitate selective etch of a conductive layer for an opposite electrode. An electrode layer of a polycrystalline ITO(Indium Tin Oxide) material and an opaque metal layer are sequentially deposited on a substrate(41), wherein the opaque metal layer includes a first non-reactive metal layer and a wire metal layer of an aluminum material. A resist pattern(500a) is formed on the wire metal layer using a half-tone exposure process. The resist pattern has a first region of a relative thick thickness, a second region of a relative thin thickness, and a third region of an opening part. In the resist pattern, the first region is used for remaining the wire metal layer, and the second region is used for removing the opaque metal layer and remaining the transparent electrode layer. The wire metal layer and the fist non-reactive metal layer are selectively etched by using the resist pattern as an etching mask. A second non-reactive metal layer(N2) is formed on lateral walls of the etched wire metal layer and the etched first non-reactive metal layer using electroless plating. The transparent electrode layer is selectively etched by using the resist pattern and the second non-reactive metal layer as an etching mask. An ashing process is performed on the resist pattern to remove the second region of the resist pattern. The wire metal layer and the first and second non-reactive metal layers are selectively etched by using the remaining resist pattern as an etching mask. The remaining resist pattern is removed. |
