| 摘要 |
PROBLEM TO BE SOLVED: To provide a thermosetting resin composition used as a protective film of a photomask, excellent in stain-preventing property, having a high light transmittance and also without forming an interference fringe even by a thin film, and capable of effectively preventing static breakdown even by using it with a chromium mask for forming a metallic pattern. SOLUTION: This thermosetting resin composition contains a silicone acrylic resin having an alkoxysilyl group and hydroxy group, a compound having fluorene skeleton, an alkoxysilane compound and a metal-chelating agent. The protective coating material obtained from the same is also provided. COPYRIGHT: (C)2007,JPO&INPIT |
