发明名称 MULTILAYER MIRROR, MANUFACTURING METHOD, EXPOSURE UNIT AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a multilayer mirror, having internal stresses reduced and restrained from changing with the elapse of time. <P>SOLUTION: The multilayer mirror 1 comprises a substrate SB and a multilayer film 10 formed on the substrate, by alternately laminating silicon and molybdenum, and reflects a light with a wavelength of 20 nm or shorter. The multilayer film 10 is composed of a combination of the first layer 12, having tensile stress and the second layer 14 having a compression stress laminated, in this order, on the substrate SB. The first layer 12 has a specified cyclic structure, consisting of a molybdenum film 12a and a silicon film 12b, and is annealed, after the formation of the layer on the substrate SB. Similarly, the second layer 14 has a specified cyclic structure consisting of a molybdenum film 14a and a silicon film 14b, and the multilayer 10 is annealed at specified conditions, after formation of the layer 14 on the first layer 12. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007183120(A) 申请公布日期 2007.07.19
申请号 JP20060000328 申请日期 2006.01.05
申请人 CANON INC 发明人 OKITA YOHEI;CHIYOU GOUSHIYU
分类号 G21K1/06;G03F7/20;H01L21/027 主分类号 G21K1/06
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