发明名称 |
WAFER EDGE ENGINEERING METHOD AND DEVICE |
摘要 |
The present invention provides an apparatus (400, 500) for ablating edge material from a substrate, e.g., SOI. The apparatus includes, among other elements, a housing and a rotatable member (401) coupled to the housing. The rotatable member is a susceptor, which is relatively flat for securing a substrate. A movable dispensing head (421) is coupled to the housing and is overlying the rotatable member. The movable dispensing head (421) is operable to emit a stream of directed fluid to one or more locations of the susceptor. The apparatus also includes a fluid source, which is coupled to the movable dispensing head. The fluid source provides fluid to ablate material from the substrate.
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申请公布号 |
WO0045421(A3) |
申请公布日期 |
2007.07.19 |
申请号 |
WO2000US02360 |
申请日期 |
2000.01.27 |
申请人 |
SILICON GENESIS CORPORATION |
发明人 |
HENLEY, FRANCOIS, J.;CHEUNG, NATHAN, W.;EN, WILLIAM, G.;MALIK, IGOR, J. |
分类号 |
H01L21/304;H01L21/3065;B05C11/02;C23F1/00;H01L21/00;H01L21/02;H01L21/306;H01L27/12 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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