发明名称 WAFER EDGE ENGINEERING METHOD AND DEVICE
摘要 The present invention provides an apparatus (400, 500) for ablating edge material from a substrate, e.g., SOI. The apparatus includes, among other elements, a housing and a rotatable member (401) coupled to the housing. The rotatable member is a susceptor, which is relatively flat for securing a substrate. A movable dispensing head (421) is coupled to the housing and is overlying the rotatable member. The movable dispensing head (421) is operable to emit a stream of directed fluid to one or more locations of the susceptor. The apparatus also includes a fluid source, which is coupled to the movable dispensing head. The fluid source provides fluid to ablate material from the substrate.
申请公布号 WO0045421(A3) 申请公布日期 2007.07.19
申请号 WO2000US02360 申请日期 2000.01.27
申请人 SILICON GENESIS CORPORATION 发明人 HENLEY, FRANCOIS, J.;CHEUNG, NATHAN, W.;EN, WILLIAM, G.;MALIK, IGOR, J.
分类号 H01L21/304;H01L21/3065;B05C11/02;C23F1/00;H01L21/00;H01L21/02;H01L21/306;H01L27/12 主分类号 H01L21/304
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