发明名称 Passivation planarization
摘要 A pixel cell is formed by locating a first passivation layer over the final layer of metal lines. Subsequently, the uneven, non-uniform passivation layer is subjected to a planarization process such as chemical mechanical polishing, mechanical abrasion, or etching. A spin-on-glass layer may be deposited over the non-uniform passivation layer prior to planarization. Once a uniform, flat first passivation layer is achieved over the final metal, a second passivation layer, a color filter array, or a lens forming layer with uniform thickness is formed over the first passivation layer. The passivation layers can be oxide, nitride, a combination of oxide and nitride, or other suitable materials. The color filter array layer may also undergo a planarization process prior to formation of the lens forming layer. The present invention is also applicable to other devices.
申请公布号 US2007166854(A1) 申请公布日期 2007.07.19
申请号 US20070717739 申请日期 2007.03.14
申请人 RHODES HOWARD E 发明人 RHODES HOWARD E.
分类号 H01L21/00;H01L21/42;H01L21/768;H01L27/146;H01L29/76 主分类号 H01L21/00
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