发明名称 SPUTTERING APPARATUS
摘要 <p>A sputtering apparatus using an AC power supply which can receive electric power with high accuracy irrespective of the distance between the place when the sputtering apparatus is installed and the place where the AC power supply is supplied. In a vacuum chamber (11), a pair of targets (41a, 41b) and an AC power supply (E) for alternatingly applying different polarity of voltages with a predetermined frequency to the paired targets are provided. The AC power supply (E) for supplying electric power is composed separately of a power supply part (6) and an oscillation part (7) having an oscillation switch circuit (72) connected to the power line from the power supply part. The oscillation part and the targets are connected through a bus bar (8).</p>
申请公布号 WO2007080906(A1) 申请公布日期 2007.07.19
申请号 WO2007JP50201 申请日期 2007.01.11
申请人 ULVAC, INC.;KOBAYASHI, MOTOSHI;KIYOTA, JUNYA;HORISHITA, YOSHIKUNI;YODA, HIDENORI;SATOU, SHIGEMITSU;NAKAJIMA, TOSHIO 发明人 KOBAYASHI, MOTOSHI;KIYOTA, JUNYA;HORISHITA, YOSHIKUNI;YODA, HIDENORI;SATOU, SHIGEMITSU;NAKAJIMA, TOSHIO
分类号 C23C14/34;C23C14/35;H05H1/24 主分类号 C23C14/34
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