发明名称 |
EPITAXIAL GROWTH OF ALIGNED ALGAINN NANOWIRES BY METAL-ORGANIC CHEMICAL VAPOR DEPOSITION |
摘要 |
Highly ordered and aligned epitaxy of III-Nitride nanowires is demonstrated in this work. <1010> M-axis is identified as a preferential nanowire growth direction through a detailed study of GaN/A1N trunk/branch nanostructures by transmission electron microscopy. Crystallographic selectivity can be used to achieve spatial and orientational control of nanowire growth. Vertically aligned (Al)GaN nanowires are prepared on Mplane AIN substrates. Horizontally ordered nanowires, extending from the M-plane sidewalls of GaN hexagonal mesas or islands demonstrate new opportunities for self aligned nanowire devices, interconnects, and networks.
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申请公布号 |
WO2006110163(A3) |
申请公布日期 |
2007.07.19 |
申请号 |
WO2005US29571 |
申请日期 |
2005.08.19 |
申请人 |
YALE UNIVERSITY;HAN, JUNG;SU, JIE |
发明人 |
HAN, JUNG;SU, JIE |
分类号 |
H01L21/20;H01L21/205;H01L21/36;H01L21/365 |
主分类号 |
H01L21/20 |
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