发明名称 Apparatus for producing silicon single crystal
摘要 A method of producing a silicon single crystal, in which a cylindrical partition is immersed in a molten pure silicon liquid or molten silicon liquid containing a Sb dopant within a crucible and the molten liquid inside the partition is pulled up from the crucible to produce the silicon single crystal, wherein an interval between a lower end of the partition and a crucible bottom is changed to control an oxygen concentration in the pulling-up silicon single crystal. The interval is reduced in the case where the oxygen concentration in the pulling-up silicon single crystal is to be increased while the interval is increased in the case where the oxygen concentration is to be reduced.
申请公布号 US5471949(A) 申请公布日期 1995.12.05
申请号 US19940330785 申请日期 1994.10.28
申请人 SUMITOMO SITIX CORPORATION 发明人 KURAMOCHI, KAORU;ITO, MAKOTO;KITAURA, KIICHIRO
分类号 C30B15/22;C30B15/00;C30B15/12;H01L21/208;(IPC1-7):C30B35/00 主分类号 C30B15/22
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