发明名称 METHOD OF MANUFACTURING A TRANSISTOR OF A SEMICONDUCTOR DEVICE
摘要 A method of manufacturing a transistor in which gate resistance is lowered and short channel effects are controlled by forming a trench-type gate. The threshold voltage can also be more tightly controlled.
申请公布号 US2007166941(A1) 申请公布日期 2007.07.19
申请号 US20060615780 申请日期 2006.12.22
申请人 PARK JEONG HO 发明人 PARK JEONG HO
分类号 H01L21/331 主分类号 H01L21/331
代理机构 代理人
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